Super-Resolution by Polarization-Dependent Two-Photon Absorption in Optical Lithography
Hiromi Ezaki and Masato Shibuya
Optical lithography faces Rayleigh diffraction limit which is limited to writing features of a size l/2, where l is the optical wavelength. We propose a new method to get super-resolution with one exposure of coherent source by using polarization-dependent two-photon absorption
resist.